Bay-5 for Device Inspection and Characterization
Hitachi TEM HT7800
The HT7800 RuliTEM is a 120 kV transmission electron microscope (TEM) with multiple lens configurations, including a standard lens for unsurpassed high contrast and a class-leading HR lens for high resolution.
This breakthrough in advanced innovative design allows for highly efficient workflows and many specialized applications. It represents the cutting-edge solution for modern TEM analyses.
Features
- Hitachi's Dual-Mode objective lens supports easy observation under low magnification, wide-field high contrast, high resolution, and more—all in one microscope.
- Normal room light operation and automated functions allow both novice and experienced operators to use the system effectively.
- Advanced stage-navigation function enables whole-grid searching and efficient image acquisition.
- Automated image stitching, 3D tomography, STEM, EDX, in-situ, and other options available for a broad range of applications.
FE-SEM Hitachi SU8010
The Hitachi SU8010 is a semi-in-lens type cold field emission FE-SEM. It offers ultra-high-resolution imaging of sample surface, and energy dispersive spectroscopy and backscattered electron detection for compositional information.
This SEM is also capable of correlative light-electron microscopy, enabling researchers to investigate details of their samples with SEM in relation to images/information collected using light microscopy.
A stunning low-kV resolution of just 1.3 nm can be achieved at a landing voltage of 1 kV by applying Hitachi’s beam deceleration technology. In this mode, a negative bias voltage is applied to the sample stage, thereby slowing down the primary electron beam to the desired landing energy.
The gain in effective resolution can be estimated from a comparison of two images: an image of the sample observed with the conventional mode, and an image of the same sample observed again under beam deceleration mode. The effective use of this mode offers superior image quality even down to the lowest energy level of just 100 eV.
Features
• Magnification at high magnification mode: 100x-800,000x
• Magnification at low magnification mode: 20x-2,000x
• Accelerating voltage: 0.5-30kV
• Landing voltage in deceleration mode: 0.1-2.0kV
• Imaging of surface structure
• Detection of backscattered electrons for z-atomic contrast
• Energy Dispersive Spectroscopy (EDS)
*J.A. Woollam V-VASE UV-VIS-NIR spectroscopic ellipsometer
The VASE® is an accurate and versatile ellipsometer for research on all types of materials: semiconductors, dielectrics, polymers, metals, multi-layers, and more. It combines high accuracy and precision with a wide spectral range – up to 193 to 3200nm. Variable wavelength and angle of incidence allow flexible measurement capabilities, including:
• Reflection and Transmission Ellipsometry
• Generalized Ellipsometry (Anisotropy, Retardance, Birefringence)
• Reflectance (R) and Transmittance (T) intensity
• Cross-polarized R/T
• Depolarization
• Scatterometry
• Mueller-matrix
Applications
-
Optical Coatings
The AutoRetarder® measures Δ accurately even when close to 0° or 180° which helps characterize thin films on transparent substrates, such as glass or plastics. Applications include decorative coatings, anti-reflection and high-reflection layers and stacks, low-emissivity films, electrochromic and photochromic layers and more.
-
Laser optics
Accurate wavelength selection using monochromator allows measurements at the operating wavelength for optics, e.g. 1550nm, 1310nm, 980nm, 632.8nm, 589nm …
-
Thin Films
VASE is sensitive to layer thickness down to sub-nanometer. For absorbing layers, the VASE allows measurement of SE and Transmission Intensity (T). When analyzed simultaneously, SE + T often allow determination of n, k, and t. For example, this thin metal layer is only 14 nm thick.
- 1 nm resolution at 15 kV, 1.4 nm at 1 kV
- 0.5 kV to 30 kV accelerating voltage
- Magnification from 30x to 800,000x
- Maximum specimen size = 100 mm
- Super ExB filter technology
- Dry vacuum system
- X+Y motorized eucentric stage with trackball interface (tilt and Z by manual control)
- Ring-type YAG backscatter detector
- Bruker Quantax EDS System for X-ray spectroscopy.
AFM Veeco’s Dimension® Icon® with ScanAsyst™
ScanAsyst™ is the world’s first imaging mode with automatic image optimization technology for atomic force microscopy (AFM). This patent-pending innovation frees researchers from the task of adjusting scan parameters, such as setpoint, feedback gains, and scan rate. Intelligent algorithms continuously monitor image quality to make appropriate parameter adjustments. This makes imaging as easy as simply selecting a scan area and scan size for almost any sample in either air or fluid. ScanAsyst is based on Veeco’s patent-pending, new general-purpose imaging mode, Peak Force Tapping™. This proprietary mode performs a very fast force curve at every pixel in the image. The peak force of each of these curves is then used as the imaging feedback signal. Unlike Tapping mode™, where imaging force is a complex function of the setpoint and other variables, Peak Force Tapping provides direct force control. This allows it to operate at even lower forces than Tapping mode, which helps protect delicate samples and tips. Together, these capabilities make ScanAsyst the most powerful and productive way to use AFM.
Features
In Air/Fluid
- Tapping: Amplitude “Set Point”
Soft Tapping: With Tip barely off the surface; default free air amplitude is 300mV
Standard: Default free air amplitude is 500mV
- Contact: Deflection “Set Point”
In Air/Fluid: Fluid eliminates attractive forces and good for biological delicate samples
Lateral Force Microscopy (LFM): Surface frictional characteristics; use low spring constant probes (~0.01 -2 N/m)
Force Volume: Map the interaction forces between a sample and the AFM tip; applications include elasticity, adhesion, electrostatic, magnetic and binding studies
Peak Force Quantitative Nanomechanical Mapping: Maps nano mechanical properties, such as modulus (1MPa to 50GPa), adhesion (10pN to 10uN)
Electrical and Magnetic Lift Modes
MFM & EFM: Tapping mode interleave techniques; maps of local electrostatic or magneto static forces; phase lag detection; map of frequency to keep constant phase
Surface Potential (AM-KPFM): Tapping mode interleave techniques; constant height above surface while applying both an AC and a DC signal to the probe
DAFMCH holder with conductive tapping mode probes: SCM-PIT, MESP or DDESP
- Piezoresponse Force Microscopy (PFM)
Optimized Vertical Domains: Imaging of response of a piezoelectric material with applied local AC electric field by the tip; polarization and orientation of domains can be mapped
DAFMCH holder with conductive tips (MESP-RC, SCM-PIT, MESP, DDESP, or OSCM-PT)
Scanner range: 85 µm by 85 µm
Scanner rate: <9.77Hz
Tip velocity: <1912um/s
Scanning lines: <4096
Z Noise (Height Sensor): 0.014nm
Z Noise (Height): 0.02nm
X-Y Resolution: Heavily sample roughness and tip radius dependent
Vibration isolation system and environmental enclosure for high-resolution imaging
Noise Floor: <0.03nm RMS
Digital image acquisition of optical microscope images
The sample vacuum platen can take up to 200mm diameter samples.
The maximum Z scanning range is 9 µm. For better scanning quality, try to make the sample surface smooth and clean.
The maximum height of a sample is of the order of 12 mm.
Quantum Design MPMS XL Magnetometer
The Quantum Design MPMS XL-5 SQUID Magnetometer is a very sensitive tool to measure the magnetization of materials, as function of temperature and magnetic field.
Features
- High sensitivity: MPMS sample magnetometers employ SQUID (Superconducting Quantum Interference Device) technology, to achieve superior measurement sensitivity and dynamic range.
- Flexible operation: the MPMS incorporates all the hardware and software needed for precise magnetic measurements in a fully integrated, modular system.
- DC Magnetization: this is the magnetic moment per unit volume (M) of a sample. If the sample doesn't have a permanent magnetic moment, a field is applied to induce one.
- AC Susceptibility: values measured include real and imaginary susceptibility, which are used to determine frequency dependence and relaxation effects.
- Automated measurements: Instruction files of up to 1500 steps can be created for immediate use, or stored on disk for later access.
Applications
Applications of the SQUID magnetometer include measurements of small quantities of paramagnetic ions, characterization of all kinds of magnetic materials, and quantitative determination of the number of unpaired electrons in samples. The MPMS-XL provides solutions for a unique class of sensitive magnetic measurements in key areas such as high-temperature superconductivity, biochemistry, and magnetic recording media. Data can be collected between H = 0 to ± 50 kOe and T = 1.7 K to 400 K. The maximum sensitivity of the instrument is in the range of 10-9 emu. Samples are typically 20 to 40 mg but strongly magnetic materials can be measured with less material.
The Quantum Design MPMS 5XL SQUID uses a Superconducting Quantum Interference Device (SQUID) Magnetometer to monitor very small changes in magnetic flux and so discover the magnetic properties of samples. It is extremely sensitive for all kinds of AC and DC magnetic measurements. The SQUID detects and measures the Magnetic Moment of the sample. From this the magnetization and magnetic susceptibility can be determined.