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Capabilities

Layout for Fabrication and Characterization

 10,000 square foot facility including Class-100/1000 (ISO Class 5/6) cleanroom and characterization space. NSU cleanroom is programmed for state-of-the-art photolithography, thin film deposition, wet and dry etch and also has the capability of nano characterization. The NSU cleanroom has full nano/microfabrication tools for nano/micro-electronics, MEMS, and biomedical devices. It contains 6” wafer handling capability from standard nanofabrication processing to packaging and characterization.

20 Students can be trained at the same time in the NSU cleanroom.

Bay-1 Thim Film Area

  • Thermal Evaporator - PVD75  
  • E-beam Evaporator  - PVD75  
  • DC sputtering           - PVD75  
  • RF sputtering            - PVD75  
  • Thermal EVA             - NTE-3000  
  • Rapid Thermal Processor - RTP-600S 
  • Tube Furances No. 1 - ThermoFisher Lindberg/Blue   
  • Tube Furances No. 2 - ThermoFisher Lindberg/Blue   

     

Bay-2 Photo-lithography Area

  • Contact Mask Aligner -  OAI 800   
  • Contact Mask Aligner -  Karl Suss MJB4  
  • Microscope System for Digital Image
  • Cee 200CB Coat-Bake System No. 1, No. 2
  • Electrical Oven No 1, No 2.
  • Fume Hood No 1, No 2.
     

Bay-3 Plasma Etching Area

  • RIE          - Phantom RIE
  • RIE/ICP   - Minilock Phantom RIE ICP

     

Bay-4 On/Off line Training Room

  • Multimidia On/Off line Education System
     

Bay-5 Testing/Inspection Area

  • Microscope No 1.
  • Microscope No 2.
  • Microscope No 3.
  • Profilometer - KLA Tencor P-16+
     

Bay-6 Wet/Chemical Facilities Area

  • Fume Hood No 3.
  • Fume Hood No 4.
  • Chemical / Basis Storage Cabinet
  • Refrigerator for Chemical